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[ Article ] Over Exposure to Efavirenz Plasma Concentrations among Beninese HIV Patients Treated by A 600 mg Daily Dose

Date de soumission: 22-02-2018
Année de Publication: 2017
Entité/Laboratoire Autres laboratoires
Document type : Article
Discipline(s) : Pharmacie, Pharmacologie & Toxicologie
Titre Over Exposure to Efavirenz Plasma Concentrations among Beninese HIV Patients Treated by A 600 mg Daily Dose
Auteurs ALLABI AUREL CONSTANT EUSTACHE [1],
Journal: Journal of Pharmacy and Pharmacology
Catégorie Journal: Internationale
Impact factor: 2.405
Volume Journal: 5
DOI: 10.17265/2328-2150
Resume Therapeutic plasma concentrations of EFV (efavirenz) are between 1,000 ng/mL and 4,000 ng/mL. Concentrations below 1000 ng/mL are associated with higher risk of treatment failure, and concentrations above 4,000 ng/mL are associated with toxicity. The aim of the study was to appreciate EFV plasmas concentrations profile and the association between plasma levels and various characteristics in Beninese patients treated by a 600 mg standard daily-dose. Blood samples were collected and EFV plasma levels were measured by liquid chromatography coupled with mass spectrometry detection in HIV-infected patients receiving EFV in combination with other antiretroviral drugs for at least 14 days. Adverse effects occurring during treatment were collected through a questionnaire. An over-exposure to EFV among Beninese HIV patients were observed, with 46.4% of patients presenting EFV concentration above 4,000 ng/mL, although adverse effects were tolerated indicating that antiretroviral treatment is safe. The measurement of plasma concentration at the steady-state could contribute to early detection of treatment failure and adapt treatment in subjects presenting serious adverse effects within context of therapeutic drug monitoring.
Mots clés HIV, efavirenz, plasma concentrations, adverse effects, Benin
Pages 628 - 635
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